Microelectronic Engineering

Elsevier BV

Journal websitePeer review: Peer review
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About the journal

Microelectronic Engineering is a journal published by Elsevier BV in Netherlands. It is listed in PUBMED according to the sources read. Declared publication charge: 2,750 USD. Facts are reproduced as recorded at their sources with their capture dates; PublishLens indicators are available after sign-in.

Basic facts

Publisher
Elsevier BV
ISSN
1873-5568 · 0167-9317
Country
Netherlands
Access
Not open access / not declared
Declared publication charge
2,750 USD
Declared peer-review model
peer_review

Index listings

  • PUBMED · 2012-10-01
Indexing
PUBMED
APC
2,750 USD
Declared review time (DOAJ)
—
Activity (OpenAlex)
Active — latest works 2026
PublishLens list status
Shown after sign-in
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Methodology signals (dated facts from their sources)

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Journal profile

Descriptive metadata from public sources (DOAJ, OpenAlex, PubMed) as of the capture date shown — contains no assessment or judgment.

Works in OpenAlex

14093

Last recorded publication year

2026

Reported by OpenAlex in 1 of 3 sources (CC0 flags, not verified indexing)DOAJSciELOOpenAlex Core

h-index

121

i10-index

5847

From OpenAlex open data (CC0).

Editorial & policy4
Observed digital preservation (Keepers registry)— snapshot 2026-10-05
CLOCKSSPortico
Norwegian register (HK-dir)— 2026
Level 1 — approved scholarly channel
Open references deposited at Crossref
90%
ORCID iDs in current deposits
8%
Deposits licence metadata at Crossref
✓
Identity & continuity1
Source type
journal
Classification(no data)

No data available to the platform for this group

No platform data for: Classification — absence is not a judgment about the journal.

Subject areas

  • Semiconductor materials and devices
  • Semiconductor materials and devices
  • Advancements in Photolithography Techniques
  • Advancements in Photolithography Techniques
  • Integrated Circuits and Semiconductor Failure Analysis
  • Integrated Circuits and Semiconductor Failure Analysis
  • Advancements in Semiconductor Devices and Circuit Design
  • Advancements in Semiconductor Devices and Circuit Design
Show all subjects (50)
  • Nanofabrication and Lithography Techniques
  • Nanofabrication and Lithography Techniques
  • Advanced Surface Polishing Techniques
  • Advanced Surface Polishing Techniques
  • Copper Interconnects and Reliability
  • Copper Interconnects and Reliability
  • Semiconductor materials and interfaces
  • Semiconductor materials and interfaces
  • Electron and X-Ray Spectroscopy Techniques
  • Electron and X-Ray Spectroscopy Techniques
  • Force Microscopy Techniques and Applications
  • Force Microscopy Techniques and Applications
  • Metal and Thin Film Mechanics
  • Metal and Thin Film Mechanics
  • Nanowire Synthesis and Applications
  • Nanowire Synthesis and Applications
  • Optical Coatings and Gratings
  • Optical Coatings and Gratings
  • 3D IC and TSV technologies
  • 3D IC and TSV technologies
  • Photonic and Optical Devices
  • Photonic and Optical Devices
  • Ferroelectric and Negative Capacitance Devices
  • Ferroelectric and Negative Capacitance Devices
  • Semiconductor Quantum Structures and Devices
  • Silicon and Solar Cell Technologies
  • Silicon and Solar Cell Technologies
  • Semiconductor Quantum Structures and Devices
  • Microfluidic and Capillary Electrophoresis Applications
  • Advanced Memory and Neural Computing
  • Microfluidic and Capillary Electrophoresis Applications
  • Advanced Memory and Neural Computing
  • Thin-Film Transistor Technologies
  • Thin-Film Transistor Technologies
  • Advanced MEMS and NEMS Technologies
  • Advanced MEMS and NEMS Technologies
  • Diverse Scientific and Economic Studies
  • Diverse Scientific and Economic Studies
  • Electronic Packaging and Soldering Technologies
  • Electronic Packaging and Soldering Technologies
  • Silicon Nanostructures and Photoluminescence
  • Silicon Nanostructures and Photoluminescence

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The journal's record in other sources:Web of Science MJLDOAJ

Everything shown here is produced automatically from named sources (DOAJ, OpenAlex, Crossref, PubMed, the Norwegian register) as of its capture date, with no human editing. Facts appear as recorded at the source; derived scores (PCI, PTD, PublishLens score) follow a published methodology. Not a judgement on the journal, not an official accreditation, not advice.

Wrong items are corrected automatically by re-reading the source (24 h for daily sources, 7 days for weekly ones) with a dated change log, and each item links to its source record. PublishLens-derived assessments are contested through the appeals mechanism (15 working days). Appeals · Indicator guide

Norwegian register data: Kanalregisteret (HK-dir, Norway) — CC BY 4.0 / NLOD — adapted: level extracted per year · OASPA member list — CC BY

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