About the journal
Ultramicroscopy is a journal published by Elsevier BV in Netherlands. It is listed in MEDLINE and PUBMED according to the sources read. Declared publication charge: 3,500 USD. Facts are reproduced as recorded at their sources with their capture dates; PublishLens indicators are available after sign-in.
Basic facts
- Publisher
- Elsevier BV
- ISSN
- 1879-2723 · 0304-3991
- Country
- Netherlands
- Access
- Not open access / not declared
- Declared publication charge
- 3,500 USD
- Declared peer-review model
- peer_review
Index listings
- MEDLINE · 1975-01-01
- PUBMED · 1989-04-01
- Indexing
- MEDLINE · PUBMED
- APC
- 3,500 USD
- Declared review time (DOAJ)
- —
- Actual review time (measured)
- 136 days received→accepted — computed from PubMed (n=99)
- Activity (OpenAlex)
- Active — latest works 2026
- PublishLens list status
- Shown after sign-in
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Methodology signals (dated facts from their sources)
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Descriptive metadata from public sources (DOAJ, OpenAlex, PubMed) as of the capture date shown — contains no assessment or judgment.
Works in OpenAlex
9791
Last recorded publication year
2026
h-index
179
i10-index
4735
From OpenAlex open data (CC0).
Editorial & policy4
- Observed digital preservation (Keepers registry)— snapshot 2026-10-05
- CLOCKSSPortico
- Norwegian register (HK-dir)— 2026
- Level 1 — approved scholarly channel
- Open references deposited at Crossref
- 95%
- ORCID iDs in current deposits
- 94%
- Deposits licence metadata at Crossref
- ✓
Identity & continuity2
- Source type
- journal
- NLM unique ID (PubMed)
- 7513702
Classification(no data)
No data available to the platform for this group
No platform data for: Classification — absence is not a judgment about the journal.
Subject areas
- Electron and X-Ray Spectroscopy Techniques
- Electron and X-Ray Spectroscopy Techniques
- Advanced Electron Microscopy Techniques and Applications
- Advanced Electron Microscopy Techniques and Applications
- Force Microscopy Techniques and Applications
- Force Microscopy Techniques and Applications
- Integrated Circuits and Semiconductor Failure Analysis
- Integrated Circuits and Semiconductor Failure Analysis
Show all subjects (50)
- Advanced X-ray Imaging Techniques
- Advanced X-ray Imaging Techniques
- Advanced Materials Characterization Techniques
- Advanced Materials Characterization Techniques
- Surface and Thin Film Phenomena
- Surface and Thin Film Phenomena
- Near-Field Optical Microscopy
- Near-Field Optical Microscopy
- X-ray Spectroscopy and Fluorescence Analysis
- X-ray Spectroscopy and Fluorescence Analysis
- Ion-surface interactions and analysis
- Ion-surface interactions and analysis
- Mechanical and Optical Resonators
- Mechanical and Optical Resonators
- Advancements in Photolithography Techniques
- Advancements in Photolithography Techniques
- Human auditory perception and evaluation
- Human auditory perception and evaluation
- Educational Robotics and Engineering
- Educational Robotics and Engineering
- Diverse Scientific and Economic Studies
- Diverse Scientific and Economic Studies
- Crystallography and Radiation Phenomena
- Crystallography and Radiation Phenomena
- Semiconductor materials and devices
- Semiconductor materials and devices
- Microstructure and mechanical properties
- Microstructure and mechanical properties
- X-ray Diffraction in Crystallography
- X-ray Diffraction in Crystallography
- Molecular Junctions and Nanostructures
- Molecular Junctions and Nanostructures
- Electronic and Structural Properties of Oxides
- Electronic and Structural Properties of Oxides
- Diamond and Carbon-based Materials Research
- Diamond and Carbon-based Materials Research
- Magnetic properties of thin films
- Magnetic properties of thin films
- Hydrogen embrittlement and corrosion behaviors in metals
- Hydrogen embrittlement and corrosion behaviors in metals
- Metal and Thin Film Mechanics
- Metal and Thin Film Mechanics
Community confirmations — what users saw in MJL or Scopus Sources; not platform verification and never part of any score.
The journal's record in other sources:Web of Science MJLDOAJ