Gongneng cailiao yu qijian xuebao

Shanghai Institute of Microsystem and Information Technology

Journal websitePeer review: Peer review
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About the journal

Gongneng cailiao yu qijian xuebao is an open-access journal published by Shanghai Institute of Microsystem and Information Technology in China, publishing in chinese. It is listed in DOAJ according to the sources read. Declared review time at DOAJ: 18 weeks. Facts are reproduced as recorded at their sources with their capture dates; PublishLens indicators are available after sign-in.

Basic facts

Publisher
Shanghai Institute of Microsystem and Information Technology
ISSN
1007-4252
Country
China
Languages
chinese
Access
Open access
Articles in DOAJ
103
Declared review time
18 weeks
Declared peer-review model
peer_review

Index listings

  • DOAJ · 2026-01-06
Indexing
DOAJ
APC
—
Declared review time (DOAJ)
18 weeks — journal-declared only (not measured)
Activity (OpenAlex)
Active — latest works 2026
PublishLens list status
Shown after sign-in
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Methodology signals (dated facts from their sources)

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Journal profile

Descriptive metadata from public sources (DOAJ, OpenAlex, PubMed) as of the capture date shown — contains no assessment or judgment.

Articles in DOAJ

103

Most recent article

last month

Average review time (journal-declared via DOAJ)

18weeks

Works in OpenAlex

1378

Last recorded publication year

2019

Reported by OpenAlex in 1 of 3 sources (CC0 flags, not verified indexing)DOAJSciELOOpenAlex Core

h-index

6

i10-index

0

From OpenAlex open data (CC0).

Editorial & policy9
Last DOAJ review date
2026-01-06
Added to DOAJ
2026-01-06
Declared plagiarism screening
Not declared
Other fees beyond APC
No
Editorial board
Official page ↗
Open references deposited at Crossref
100%
ORCID iDs in current deposits
0%
Enrolled in Crossref Similarity Check
✓
Peer-review policy
View policy
Identity & continuity1
Source type
journal
Classification2

Subjects (DOAJ)

Technology: Electrical engineering. Electronics. Nuclear engineering: Materials of engineering and construction. Mechanics of materials

LCC codes

TA401-492

Subject areas

  • Gas Sensing Nanomaterials and Sensors
  • Gas Sensing Nanomaterials and Sensors
  • Linguistic, Cultural, and Literary Studies
  • Legal and Regulatory Analysis
  • Legal and Regulatory Analysis
  • Military Technology and Strategies
  • Linguistic, Cultural, and Literary Studies
  • Military Technology and Strategies
Show all subjects (50)
  • Semiconductor materials and devices
  • Semiconductor materials and devices
  • Advanced MEMS and NEMS Technologies
  • Advanced MEMS and NEMS Technologies
  • GaN-based semiconductor devices and materials
  • GaN-based semiconductor devices and materials
  • ZnO doping and properties
  • ZnO doping and properties
  • Acoustic Wave Resonator Technologies
  • Acoustic Wave Resonator Technologies
  • Magnetic Properties and Applications
  • Magnetic Properties and Applications
  • Analytical Chemistry and Sensors
  • Semiconductor Quantum Structures and Devices
  • Analytical Chemistry and Sensors
  • Semiconductor Quantum Structures and Devices
  • Metal and Thin Film Mechanics
  • Metal and Thin Film Mechanics
  • Semiconductor Lasers and Optical Devices
  • Diamond and Carbon-based Materials Research
  • Semiconductor Lasers and Optical Devices
  • Diamond and Carbon-based Materials Research
  • Silicon Nanostructures and Photoluminescence
  • Silicon Nanostructures and Photoluminescence
  • Thin-Film Transistor Technologies
  • Thin-Film Transistor Technologies
  • Photonic and Optical Devices
  • Photonic and Optical Devices
  • Ferroelectric and Piezoelectric Materials
  • Ferroelectric and Piezoelectric Materials
  • Advancements in Semiconductor Devices and Circuit Design
  • Advanced Sensor and Control Systems
  • Advanced Sensor and Control Systems
  • Advancements in Semiconductor Devices and Circuit Design
  • Conducting polymers and applications
  • Conducting polymers and applications
  • Advanced Surface Polishing Techniques
  • Magnetic properties of thin films
  • Magnetic properties of thin films
  • Advanced Surface Polishing Techniques
  • Silicon and Solar Cell Technologies
  • Silicon and Solar Cell Technologies

Keywords (DOAJ)

  • semiconductors
  • microelectronics
  • integrated circuits
  • materials science
  • devices

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The journal's record in other sources:Web of Science MJLDOAJ

Everything shown here is produced automatically from named sources (DOAJ, OpenAlex, Crossref, PubMed, the Norwegian register) as of its capture date, with no human editing. Facts appear as recorded at the source; derived scores (PCI, PTD, PublishLens score) follow a published methodology. Not a judgement on the journal, not an official accreditation, not advice.

Wrong items are corrected automatically by re-reading the source (24 h for daily sources, 7 days for weekly ones) with a dated change log, and each item links to its source record. PublishLens-derived assessments are contested through the appeals mechanism (15 working days). Appeals · Indicator guide

Norwegian register data: Kanalregisteret (HK-dir, Norway) — CC BY 4.0 / NLOD — adapted: level extracted per year · OASPA member list — CC BY

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